Tungsten foil may be prepared by electropolishing in sulfuric acid-methanol for equation of state (EOS) target. The tungsten foil may be prepared with high surface quality (RMS roughness less than 50nm) and thickness uniformity beyond 99%, and may keep the density of raw materials so that this foil can satisfy the requirement of laser driven materials for the research of high temperature and pressure EOS. Thus, electropolishing is a significant method for preparing the foil which can fulfill the requirement of EOS target.
There are two common preparation methods of tungsten foil as follows:
1. Deposition method, such as evaporation coating, sputtering deposition, and vapor deposition, etc.
2. Mechanical method, such as rolling, diamond turning, mechanical polishing, and so on.
While electropolishing is preferred. This producing method is based on the principle of anodic dissolution to remove metals and is suitable for any metal. Also, it can eliminate the problems of surface hardening, defects, and contamination.
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